Effects of the support on the desorption kinetics of n -pentane from graphene: An ultrahigh vacuum adsorption study

N. Sivapragasam; M. T. Nayakasinghe; A. Chakradhar; U. Burghaus

doi:10.1116/1.4989814

Effects of the support on the desorption kinetics of n -pentane from graphene: An ultrahigh vacuum adsorption study

N. Sivapragasam
, M. T. Nayakasinghe
, A. Chakradhar
, U. Burghaus

North Dakota State University

Research output: Contribution to journal › Article › peer-review

Abstract

Adsorption kinetics of n-pentane on physical vapor deposited graphene/Ru(0001), chemical vapor deposited (CVD) graphene/Cu, and CVD graphene/SiO₂ was studied by thermal desorption spectroscopy. The adsorption kinetics was affected by the support with desorption energies increasing as graphene/SiO₂ < graphene/Cu < graphene/Ru(0001).

Original language	English
Article number	061404
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	35
Issue number	6
DOIs	https://doi.org/10.1116/1.4989814
Publication status	Published - 1 Nov 2017
Externally published	Yes

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10.1116/1.4989814

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title = "Effects of the support on the desorption kinetics of n -pentane from graphene: An ultrahigh vacuum adsorption study",

abstract = "Adsorption kinetics of n-pentane on physical vapor deposited graphene/Ru(0001), chemical vapor deposited (CVD) graphene/Cu, and CVD graphene/SiO2 was studied by thermal desorption spectroscopy. The adsorption kinetics was affected by the support with desorption energies increasing as graphene/SiO2 < graphene/Cu < graphene/Ru(0001).",

author = "N. Sivapragasam and Nayakasinghe, \{M. T.\} and A. Chakradhar and U. Burghaus",

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T2 - An ultrahigh vacuum adsorption study

AU - Sivapragasam, N.

AU - Nayakasinghe, M. T.

AU - Chakradhar, A.

AU - Burghaus, U.

PY - 2017/11/1

Y1 - 2017/11/1

N2 - Adsorption kinetics of n-pentane on physical vapor deposited graphene/Ru(0001), chemical vapor deposited (CVD) graphene/Cu, and CVD graphene/SiO2 was studied by thermal desorption spectroscopy. The adsorption kinetics was affected by the support with desorption energies increasing as graphene/SiO2 < graphene/Cu < graphene/Ru(0001).

AB - Adsorption kinetics of n-pentane on physical vapor deposited graphene/Ru(0001), chemical vapor deposited (CVD) graphene/Cu, and CVD graphene/SiO2 was studied by thermal desorption spectroscopy. The adsorption kinetics was affected by the support with desorption energies increasing as graphene/SiO2 < graphene/Cu < graphene/Ru(0001).

UR - https://www.scopus.com/pages/publications/85028543042

U2 - 10.1116/1.4989814

DO - 10.1116/1.4989814

M3 - Article

AN - SCOPUS:85028543042

SN - 0734-2101

VL - 35

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 6

M1 - 061404

ER -

Effects of the support on the desorption kinetics of n -pentane from graphene: An ultrahigh vacuum adsorption study

Abstract

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