Electrical properties of creep-resistant nanocrystalline gold-vanadium thin films at millimeter-wave frequencies

Research output: Chapter in Book/Report/Conference proceedingsChapterpeer-review

Abstract

This paper reports on the mechanical and electrical properties of creep-resistant nanocrystalline gold-vanadium (Au-V) thin films that are employed in electrostatically- A ctuated microcorrugated diaphragms (MCDs) of frequency-reconfigurable all-silicon cavity filters. Solid solution strengthened Au-V MCDs featuring the lowest stress relaxation to date were built and experimentally tested. In a 3-hour stress relaxation experiment under a 20-μm constant displacement, they exhibited a 6.2% decay and a rate of stress relaxation (at the 3rd hour) that is 9.7×/5.4× lower than that of previously reported Au/Au-V MCDs. Grounded coplanar waveguide transmission lines were built and measured on a quartz substrate in order to experimentally evaluate the electrical properties (sheet resistance: Rs, conductivity: σ, and attenuation factor: α) of the Au-V thin films through DC and RF measurements in the 20-40 GHz band. These were specified as follows for the annealed Au-V (2.2 atomic percent of V) thin films: Rs = 339.10 m/□, σ = 5.9 MS/m, α = 0.327-0.410 dB/mm.

Original languageEnglish
Title of host publicationSiRF 2016 - 2016 IEEE 16th Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages21-23
Number of pages3
ISBN (Electronic)9781509016877
DOIs
Publication statusPublished - 31 Mar 2016
Externally publishedYes
Event16th IEEE Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems, SiRF 2016 - Austin, United States
Duration: 24 Jan 201627 Jan 2016

Publication series

NameSiRF 2016 - 2016 IEEE 16th Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems

Conference

Conference16th IEEE Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems, SiRF 2016
Country/TerritoryUnited States
CityAustin
Period24/01/1627/01/16

Keywords

  • Electrical conductivity
  • gold-vanadium
  • grounded coplanar waveguide
  • insertion loss
  • millimeter-wave
  • nanocrystal-line
  • stress relaxation
  • thin film

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