Electrical, structural, and chemical properties of HfO2 films formed by electron beam evaporation

Karim Cherkaoui; Scott Monaghan; Muhammad A Negara; Mircea Modreanu; Paul K Hurley; Dan O’Connell; Stephen McDonnell; Gregory Hughes; S Wright; RC Barklie; others

Electrical, structural, and chemical properties of HfO2 films formed by electron beam evaporation

Karim Cherkaoui
, Scott Monaghan
, Muhammad A Negara
, Mircea Modreanu
, Paul K Hurley
, Dan O’Connell
, Stephen McDonnell
, Gregory Hughes
, S Wright
, RC Barklie
, others

Tyndall MicroNano Systems

Research output: Contribution to journal › Article › peer-review

Original language	Undefined/Unknown
Journal	Journal of Applied Physics
Publication status	Published - 2008

Cite this

@article{bb7b22520b124b9fa78f68796b05aef5,

title = "Electrical, structural, and chemical properties of HfO2 films formed by electron beam evaporation",

author = "Karim Cherkaoui and Scott Monaghan and Negara, \{Muhammad A\} and Mircea Modreanu and Hurley, \{Paul K\} and Dan O{\textquoteright}Connell and Stephen McDonnell and Gregory Hughes and S Wright and RC Barklie and others",

year = "2008",

language = "Undefined/Unknown",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

}

TY - JOUR

T1 - Electrical, structural, and chemical properties of HfO2 films formed by electron beam evaporation

AU - Cherkaoui, Karim

AU - Monaghan, Scott

AU - Negara, Muhammad A

AU - Modreanu, Mircea

AU - Hurley, Paul K

AU - O’Connell, Dan

AU - McDonnell, Stephen

AU - Hughes, Gregory

AU - Wright, S

AU - Barklie, RC

AU - others,

PY - 2008

Y1 - 2008

M3 - Article

SN - 0021-8979

JO - Journal of Applied Physics

JF - Journal of Applied Physics

ER -