Evolution of fluorine and boron profiles during annealing in crystalline Si
- Pedro López
- , Lourdes Pelaz
- , Ray Duffy
- , P. Meunier-Beillard
- , F. Roozeboom
- , K. Van Der Tak
- , P. Breimer
- , J. G.M. Van Berkum
- , M. A. Verheijen
- , M. Kaiser
- University of Valladolid
- NXP Semiconductors
- Koninklijke Philips N.V.
Research output: Contribution to journal › Article › peer-review