Fabrication of HfO 2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS application

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@article{58da318378d74d78ba3f42f95ac264d3,

title = "Fabrication of HfO 2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS application",

author = "Ailbe O'Manachain",

year = "2011",

doi = "10.1186/1556-276X-6-400",

language = "Undefined/Unknown",

journal = "Nanoscale Research Letters",

issn = "1931-7573",

publisher = "Springer New York",

}