Fabrication of HfO2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS application

Marcos Benedicto; Beatriz Galiana; Jon M Molina-Aldareguia; Scott Monaghan; Paul K Hurley; Karim Cherkaoui; Luis Vazquez; Paloma Tejedor

Fabrication of HfO2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS application

Marcos Benedicto
, Beatriz Galiana
, Jon M Molina-Aldareguia
, Scott Monaghan
, Paul K Hurley
, Karim Cherkaoui
, Luis Vazquez
, Paloma Tejedor

Tyndall MicroNano Systems

Research output: Contribution to journal › Article › peer-review

Original language	Undefined/Unknown
Journal	Nanoscale Research Letters
Publication status	Published - 2011

Cite this

@article{b67e1fdb63cd48bc8d37c36ec87a8171,

title = "Fabrication of HfO2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS application",

author = "Marcos Benedicto and Beatriz Galiana and Molina-Aldareguia, \{Jon M\} and Scott Monaghan and Hurley, \{Paul K\} and Karim Cherkaoui and Luis Vazquez and Paloma Tejedor",

year = "2011",

language = "Undefined/Unknown",

journal = "Nanoscale Research Letters",

issn = "1931-7573",

publisher = "Springer New York",

}

TY - JOUR

T1 - Fabrication of HfO2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS application

AU - Benedicto, Marcos

AU - Galiana, Beatriz

AU - Molina-Aldareguia, Jon M

AU - Monaghan, Scott

AU - Hurley, Paul K

AU - Cherkaoui, Karim

AU - Vazquez, Luis

AU - Tejedor, Paloma

PY - 2011

Y1 - 2011

M3 - Article

SN - 1931-7573

JO - Nanoscale Research Letters

JF - Nanoscale Research Letters

ER -