Fabrication of long wavelength microresonators

B. Corbett; L. Considine; S. Walsh; J. Justice; W. M. Kelly; Lee Maltings

Fabrication of long wavelength microresonators

B. Corbett
, L. Considine
, S. Walsh
, J. Justice
, W. M. Kelly
, Lee Maltings

Natl Microelectronics Research Cent

Research output: Contribution to conference › Paper › peer-review

Abstract

Microresonators structures were patterned using a selective wet chemical etch (between semiconductor and adjacent layers). As mask undercutting proceeds the etch profile becomes more anisotropic. Wet etching will be essential for the operation of submicron devices due to reduced surface damage compared with dry etching. The epilayer contains three sets of three quantum wells. The quantum wells are placed resonant with the antinodes of the final optical cavity, which is formed by depositing silicon dioxide and silicon layers.

Original language	English
Publication status	Published - 1994
Externally published	Yes
Event	Proceedings of the 1994 Conference on Lasers and Electro-Optics Europe - Amsterdam, Neth Duration: 28 Aug 1994 → 2 Sep 1994

Conference

Conference	Proceedings of the 1994 Conference on Lasers and Electro-Optics Europe
City	Amsterdam, Neth
Period	28/08/94 → 2/09/94

Cite this

@conference{2288a79b722045eab9b62d00a78cf462,

title = "Fabrication of long wavelength microresonators",

abstract = "Microresonators structures were patterned using a selective wet chemical etch (between semiconductor and adjacent layers). As mask undercutting proceeds the etch profile becomes more anisotropic. Wet etching will be essential for the operation of submicron devices due to reduced surface damage compared with dry etching. The epilayer contains three sets of three quantum wells. The quantum wells are placed resonant with the antinodes of the final optical cavity, which is formed by depositing silicon dioxide and silicon layers.",

author = "B. Corbett and L. Considine and S. Walsh and J. Justice and Kelly, \{W. M.\} and Lee Maltings",

year = "1994",

language = "English",

note = "Proceedings of the 1994 Conference on Lasers and Electro-Optics Europe ; Conference date: 28-08-1994 Through 02-09-1994",

}

TY - CONF

T1 - Fabrication of long wavelength microresonators

AU - Corbett, B.

AU - Considine, L.

AU - Walsh, S.

AU - Justice, J.

AU - Kelly, W. M.

AU - Maltings, Lee

PY - 1994

Y1 - 1994

N2 - Microresonators structures were patterned using a selective wet chemical etch (between semiconductor and adjacent layers). As mask undercutting proceeds the etch profile becomes more anisotropic. Wet etching will be essential for the operation of submicron devices due to reduced surface damage compared with dry etching. The epilayer contains three sets of three quantum wells. The quantum wells are placed resonant with the antinodes of the final optical cavity, which is formed by depositing silicon dioxide and silicon layers.

AB - Microresonators structures were patterned using a selective wet chemical etch (between semiconductor and adjacent layers). As mask undercutting proceeds the etch profile becomes more anisotropic. Wet etching will be essential for the operation of submicron devices due to reduced surface damage compared with dry etching. The epilayer contains three sets of three quantum wells. The quantum wells are placed resonant with the antinodes of the final optical cavity, which is formed by depositing silicon dioxide and silicon layers.

UR - https://www.scopus.com/pages/publications/0028554748

M3 - Paper

AN - SCOPUS:0028554748

T2 - Proceedings of the 1994 Conference on Lasers and Electro-Optics Europe

Y2 - 28 August 1994 through 2 September 1994

ER -

Fabrication of long wavelength microresonators

Abstract

Conference

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