Abstract
We use first-principles electronic-structure theory to determine the intra- and intervalley electron-alloy scattering parameters in n-type Ge-Sn alloys. These parameters are used to determine the alloy scattering contributions to the n-type electron mobility of Ge-Sn at 300 and 15K using a first iteration of the Boltzmann transport equation in the relaxation-time approximation. For unstrained Ge-Sn, we find that an Sn concentration of at least 13.5% is needed to achieve an electron mobility greater than that of Ge. Our results show that the mobility of Ge-Sn can be over 25 times that of Ge, or 105cm2/(Vs). At 15K, incorporation of less than 6% Sn into Ge quadruples its mobility, which suggests that Ge-Sn has potential applications as a high-mobility 2D electron gas. Applying biaxial tensile strain to Ge-Sn further increases the mobility and achieves this improvement at lower Sn content than in unstrained Ge-Sn.
| Original language | English |
|---|---|
| Article number | 014074 |
| Journal | Physical Review Applied |
| Volume | 23 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - Jan 2025 |
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