First-principles studies of the defect formation in III-V FETs grown by fin replacement method
- H. Minari
- , S. Yoshida
- , K. Sawada
- , M. Nakazawa
- , M. Caymax
- , C. Merckling
- , N. Waldron
- , W. Guo
- , S. Jiang
- , N. Collaert
- , E. Simoen
- , D. Lin
- , G. Pourtois
Research output: Contribution to journal › Article › peer-review