Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour process

Engineering

• Nanowire 100%
• Feature Size 100%
• Silicon Substrate 100%
• Microelectronics 50%
• High Aspect Ratio 50%
• Self-Assembled Monolayers 50%
• Thin Films 50%
• Iron 50%
• Molecular Mass 50%
• Molecular Weight 50%
• Defect Density 50%
• Interfacial Energy 50%
• Pattern Transfer 50%
• Nanometer Range 50%

Material Science

• Silicon 100%
• Block Copolymer 100%
• Nanowire 66%
• Polystyrene 66%
• Copolymer 66%
• Thin Films 33%
• Self Assembled Monolayer 33%
• Defect Density 33%
• Surface Treatment 33%
• Iron Oxide 33%

Chemical Engineering

• Block Copolymer 100%
• Nanowire 66%
• Polystyrene 66%
• Film 33%
• Scalability 33%
• Ethylene 33%
• Iron Oxide 33%