Fractal growth of copper in a gel medium

S. Bandyopadhyay; S. Roy; D. Chakravorty

doi:10.1016/0038-1098(96)00326-2

Fractal growth of copper in a gel medium

S. Bandyopadhyay
, S. Roy
, D. Chakravorty

Research output: Contribution to journal › Article › peer-review

Abstract

Fractal growth of electrodeposited copper in a gel medium with different concentrations of copper ions has been studied. The fractal dimensions (d_f) show a periodic variation as a function of voltage with the values varying from 2.0 to 1.75. The behaviour is explained on the basis of two mechanisms, viz. generalized diffusion limited aggregation and dielectric breakdown. Electron micrographs of the samples indicate that the clusters consist of metallic copper having dimensions in the range 6.2-20.8 nm. Metal particle size can be varied by changing the applied voltage.

Original language	English
Pages (from-to)	835-838
Number of pages	4
Journal	Solid State Communications
Volume	99
Issue number	11
DOIs	https://doi.org/10.1016/0038-1098(96)00326-2
Publication status	Published - Sep 1996
Externally published	Yes

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title = "Fractal growth of copper in a gel medium",

abstract = "Fractal growth of electrodeposited copper in a gel medium with different concentrations of copper ions has been studied. The fractal dimensions (df) show a periodic variation as a function of voltage with the values varying from 2.0 to 1.75. The behaviour is explained on the basis of two mechanisms, viz. generalized diffusion limited aggregation and dielectric breakdown. Electron micrographs of the samples indicate that the clusters consist of metallic copper having dimensions in the range 6.2-20.8 nm. Metal particle size can be varied by changing the applied voltage.",

author = "S. Bandyopadhyay and S. Roy and D. Chakravorty",

year = "1996",

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doi = "10.1016/0038-1098(96)00326-2",

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AU - Bandyopadhyay, S.

AU - Roy, S.

AU - Chakravorty, D.

PY - 1996/9

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N2 - Fractal growth of electrodeposited copper in a gel medium with different concentrations of copper ions has been studied. The fractal dimensions (df) show a periodic variation as a function of voltage with the values varying from 2.0 to 1.75. The behaviour is explained on the basis of two mechanisms, viz. generalized diffusion limited aggregation and dielectric breakdown. Electron micrographs of the samples indicate that the clusters consist of metallic copper having dimensions in the range 6.2-20.8 nm. Metal particle size can be varied by changing the applied voltage.

AB - Fractal growth of electrodeposited copper in a gel medium with different concentrations of copper ions has been studied. The fractal dimensions (df) show a periodic variation as a function of voltage with the values varying from 2.0 to 1.75. The behaviour is explained on the basis of two mechanisms, viz. generalized diffusion limited aggregation and dielectric breakdown. Electron micrographs of the samples indicate that the clusters consist of metallic copper having dimensions in the range 6.2-20.8 nm. Metal particle size can be varied by changing the applied voltage.

UR - https://www.scopus.com/pages/publications/0030240992

U2 - 10.1016/0038-1098(96)00326-2

DO - 10.1016/0038-1098(96)00326-2

M3 - Article

AN - SCOPUS:0030240992

SN - 0038-1098

VL - 99

SP - 835

EP - 838

JO - Solid State Communications

JF - Solid State Communications

IS - 11

ER -

Fractal growth of copper in a gel medium

Abstract

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