Gentle FUSI NiSi metal gate process for high-k dielectric screening

  • H. D.B. Gottlob
  • , M. C. Lemme
  • , M. Schmidt
  • , T. J. Echtermeyer
  • , T. Mollenhauer
  • , H. Kurz
  • , K. Cherkaoui
  • , P. K. Hurley
  • , S. B. Newcomb

Research output: Contribution to journal › Article › peer-review

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