TY - JOUR
T1 - Growth of thin films of molybdenum and tungsten oxides by combustion CVD using aqueous precursor solutions
AU - Davis, Martin J.
AU - Benito, Guillermo
AU - Sheel, David W.
AU - Pemble, Martyn E.
PY - 2004/1
Y1 - 2004/1
N2 - Using combustion (C) CVD, layers of molybdenum and tungsten oxides have been deposited on glass and silicon at low temperatures. Inexpensive ammonium salts of molybdate and metatungstate ions were used as precursors and were delivered to the coating flame as an aqueous solution using a nebulizer. The resulting films were analyzed by scanning electron microscopy (SEM), energy-dispersive analysis of X-rays (EDAX), Rutherford backscattering (RBS), X-ray photoelectron spectroscopy (XPS), and X-ray diffraction (XRD). These indicated that the films were continuous, moderately smooth, and consisted of amorphous, disordered molybdenum and tungsten trioxides.
AB - Using combustion (C) CVD, layers of molybdenum and tungsten oxides have been deposited on glass and silicon at low temperatures. Inexpensive ammonium salts of molybdate and metatungstate ions were used as precursors and were delivered to the coating flame as an aqueous solution using a nebulizer. The resulting films were analyzed by scanning electron microscopy (SEM), energy-dispersive analysis of X-rays (EDAX), Rutherford backscattering (RBS), X-ray photoelectron spectroscopy (XPS), and X-ray diffraction (XRD). These indicated that the films were continuous, moderately smooth, and consisted of amorphous, disordered molybdenum and tungsten trioxides.
UR - https://www.scopus.com/pages/publications/1142293207
U2 - 10.1002/cvde.200306260
DO - 10.1002/cvde.200306260
M3 - Article
AN - SCOPUS:1142293207
SN - 0948-1907
VL - 10
SP - 29
EP - 34
JO - Chemical Vapor Deposition
JF - Chemical Vapor Deposition
IS - 1
ER -