Half-cycle atomic layer deposition reaction study using O3 and H2O oxidation of Al2O3 on In 0.53Ga0.47As
- B. Brennan
- , M. Milojevic
- , H. C. Kim
- , P. K. Hurley
- , J. Kim
- , G. Hughes
- , R. M. Wallace
- Dublin City University
- University of Texas at Dallas
Research output: Contribution to journal › Article › peer-review