Hall-effect mobility for a selection of natural and synthetic 2D semiconductor crystals

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Abstract

We present a DC-AC Hall-effect analysis on transition-metal-dichalcogenides comprising natural crystals of molybdenum disulfide and tungsten diselenide; and synthetic crystals of hafnium diselenide, molybdenum ditelluride, molybdenum diselenide and niobium-doped molybdenum disulfide. We observe a wide range of Hall mobility and carrier concentration values with either a net electron or hole carrier type. The synthetic niobium-doped molybdenum disulfide crystal exhibits a net hole carrier type and a carrier concentration approximately two orders of magnitude higher than a non-intentionally doped natural molybdenum disulfide crystal, with an equivalent reduction in Hall mobility. This synthetic niobium-doped molybdenum disulfide crystal also shows a significantly reduced resistivity when compared to the other crystals. Secondary ion mass spectrometry shows higher counts of niobium in the intentionally-doped synthetic niobium-molybdenum disulfide crystal, in addition to various other high contamination counts in both the natural and synthetic molybdenum disulfide crystals, correlating well with the significant range of high resistivity observed. Compared to silicon, the resistivity in these contaminated TMD materials reduces less rapidly with increasing equivalent carrier concentration levels, and the resistivity is higher in magnitude by a factor of approximately 4-10 when compared to silicon, which in turn reduces the achievable Hall mobility by at least a similar factor. It is therefore suggested that more controlled growth methods of TMD materials which lead to significantly reduced contamination elements and levels, with improved stoichiometry, could potentially provide a significant increase in Hall mobility assuming no change in carrier properties.

Original languageEnglish
Title of host publicationJoint International EUROSOl Workshop and International Conference on Ultimate Integration on Silicon-ULIS, EUROSOI-ULIS 2017 - Proceedings
EditorsAndroula G. Nassiopoulou, Panagiotis Sarafis
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages27-30
Number of pages4
ISBN (Electronic)9781509053131
DOIs
Publication statusPublished - 29 Jun 2017
Event2017 Joint International EUROSOl Workshop and International Conference on Ultimate Integration on Silicon-ULIS, EUROSOI-ULIS 2017 - Athens, Greece
Duration: 3 Apr 20175 Apr 2017

Publication series

NameJoint International EUROSOl Workshop and International Conference on Ultimate Integration on Silicon-ULIS, EUROSOI-ULIS 2017 - Proceedings

Conference

Conference2017 Joint International EUROSOl Workshop and International Conference on Ultimate Integration on Silicon-ULIS, EUROSOI-ULIS 2017
Country/TerritoryGreece
CityAthens
Period3/04/175/04/17

Keywords

  • 2D materials
  • AC Hall
  • chalcogens
  • crystals
  • DC Hall
  • mobility
  • resistivity
  • secondary ion mass spectrometry (SIMS)
  • semiconductor
  • TMDs
  • transition metals
  • transitionmetal-dichalcogenides

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