Abstract
Al0.49Ga0.51N/Al0.16Ga0.84N distributed Bragg reflectors (DBR) grown on sapphire substrates by metalorganic chemical vapor deposition (MOCVD) was analyzed. High-quality Al 0.49Ga0.51N/Al0.16Ga0.84N DBRs with peak reflectivity of 91% and a bandwidth of 17 nm at 353 nm were grown. When the peak wavelength was shifted to 347 nm by modifying the layer thickness, the peak reflectivity was found to decrease and the stop band became asymmetric. This distortion of the reflectivity spectrum was identified as being due to internal absorption from the Al0.16Ga0.84N layers in the DBR.
| Original language | English |
|---|---|
| Pages (from-to) | 43-45 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 85 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 5 Jul 2004 |
| Externally published | Yes |