Improved fin width scaling in fully-depleted FinFETs by source-drain implant optimization
- R. Duffy
- , M. J.H. Van Dal
- , B. J. Pawlak
- , N. Collaert
- , L. Witters
- , R. Rooyackers
- , M. Kaiser
- , R. G.R. Weemaes
- , M. Jurczak
- , R. J.P. Lander
Research output: Chapter in Book/Report/Conference proceedings › Conference proceeding › peer-review