@inproceedings{a1ee284a564f4d9cbb629c036e745926,
title = "Improved high permeability CoZrTaB laminated thin films with novel CMOS compatible dielectric material",
abstract = "This paper present an optimized CoZrTaB-based laminated thin films with a novel wet etch-able oxide dielectric material. Wet etching capability was studied on the stack material exhibiting a narrow and clean undercut. Good uniaxial anisotropy with low coercivity was achieved via in-situ magnetic alignment during magnetron sputtering. Permeability of 432 and Q-factor of 23.4 at 100 MHz were observed in high frequency permeameter measurement. Finally thermal annealing was carried out at various temperatures. Uniaxial anisotropy was maintained up to 300 °C, while an enhancement of permeability (by 25\%) was observed.",
keywords = "CMOS compatible, high frequency soft magnetic material, high permeability, inductor",
author = "Guannan Wei and Rajasree Das and Daniel Lordan and Ranajit Sai and Mike Hayes and Marek Lorenc and Barry Clarke and David Hurley and Paul McCloskey",
note = "Publisher Copyright: {\textcopyright} 2023 IEEE.; 2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 ; Conference date: 15-05-2023 Through 19-05-2023",
year = "2023",
doi = "10.1109/INTERMAGShortPapers58606.2023.10228354",
language = "English",
series = "2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
booktitle = "2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings",
address = "United States",
}