Improved near- and far-field distributions in broad area semiconductor lasers with enhanced current spreading

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Abstract

A novel semiconductor laser design with enhanced lateral current spreading is demonstrated. Tailoring of the injection current profile to eliminate sharp edges improves the far-fields, with narrower and symmetrical patterns when compared to a standard broad area laser. This is achieved by introducing a 10 μm p-GaAs layer during the growth of a standard GRINSCH structure. The device is called enhanced current spreading (ECS) laser. The far-field at a total output power of 0.6 W is single lobed, symmetric, and less than 60 percent narrower than the standard device.

Original languageEnglish
Pages (from-to)346-347
Number of pages2
JournalConference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
Volume1
Publication statusPublished - 1998
EventProceedings of the 1998 11th Annual Meeting IEEE Lasers and Electro-Optics Society, LEOS. Part 2 (of 2) - Orlando, FL, USA
Duration: 1 Dec 19984 Dec 1998

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