Abstract
A novel semiconductor laser design with enhanced lateral current spreading is demonstrated. Tailoring of the injection current profile to eliminate sharp edges improves the far-fields, with narrower and symmetrical patterns when compared to a standard broad area laser. This is achieved by introducing a 10 μm p-GaAs layer during the growth of a standard GRINSCH structure. The device is called enhanced current spreading (ECS) laser. The far-field at a total output power of 0.6 W is single lobed, symmetric, and less than 60 percent narrower than the standard device.
| Original language | English |
|---|---|
| Pages (from-to) | 346-347 |
| Number of pages | 2 |
| Journal | Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS |
| Volume | 1 |
| Publication status | Published - 1998 |
| Event | Proceedings of the 1998 11th Annual Meeting IEEE Lasers and Electro-Optics Society, LEOS. Part 2 (of 2) - Orlando, FL, USA Duration: 1 Dec 1998 → 4 Dec 1998 |