In-situ characterization of Ga2O passivation of In 0.53Ga0.47As prior to high-k dielectric atomic layer deposition

  • M. Milojevic
  • , R. Contreras-Guerrero
  • , E. O'Connor
  • , B. Brennan
  • , P. K. Hurley
  • , J. Kim
  • , C. L. Hinkle
  • , R. M. Wallace

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