In situ HCl etching of InP in shallow-trench-isolated structures
- T. Orzali
- , G. Wang
- , N. Waldron
- , C. Merckling
- , O. Richard
- , H. Bender
- , W. E. Wang
- , M. Caymax
- Interuniversitair Micro-Elektronica Centrum
- Inc.
Research output: Contribution to journal › Article › peer-review