@inproceedings{6bef8dd0cca749b7a597898a06aa3d25,
title = "In-situ probing of atomic layer deposition processes using infrared and near infrared spectroscopy",
abstract = "The monitoring of chemical vapour deposition, and its variant atomic layer deposition, by in-situ spectroscopic methods is well established and has been used to elucidate many important details of the dynamics, kinetics and mechanisms of these complex processes. Here we examine two in-situ gas phase probes that we have been employing, firstly, Fourier transform mid and nearinfrared spectroscopy to elucidate the nature of the gas phase products, and secondly, the use of near infrared tunable diode laser spectroscopy to spatially and temporally resolve the spectral features due to either reactants or products. Data is presented for the i) Al2O3 from Al(CH3)3 and H2O and; ii) HfO2 from Hf[N(C H3)2]4 and H2O growth systems.",
author = "A. O'Mahony and Povey, \{I. M.\} and Pemble, \{M. E.\}",
year = "2009",
doi = "10.1149/1.2980011",
language = "English",
isbn = "9781566776509",
series = "ECS Transactions",
publisher = "Electrochemical Society Inc.",
number = "4",
pages = "349--354",
booktitle = "ECS Transactions - Atomic Layer Deposition Applications 4",
address = "United States",
edition = "4",
note = "Atomic Layer Deposition Applications 4 - 214th ECS Meeting ; Conference date: 13-10-2008 Through 15-10-2008",
}