Indium tin oxide–silicon nanocrystal nanocomposite grown by aerosol assisted chemical vapour deposition

Nanocomposite films were successfully grown by aerosol-assisted chemical vapour deposition (CVD) in a single deposition step using a mixture of indium tin neodecanoate and ligand stabilised silicon nanocrystals. Samples were analysed by HRTEM and silicon nanocrystals with a density of 1.2 × 10¹² cm⁻² were observed. From the reconstructed 3D tomogram, the averaged distance between the nearest nanoparticles is 8.3 nm and the 3D density of nanoparticles is 1.6 × 10¹⁸ cm⁻³. An animation of the 3D reconstruction is supplied in the supporting information. These data show the versatility of aerosol assisted CVD in achieving a nanocomposite with such a density of silicon nanocrystals, of carefully controlled size and shape, within a polycrystalline host matrix. Therefore, meeting the density and size distribution requirements of particle inclusion in active nanocomposites for photovoltaic structures. Graphical abstract: ITO–silicon nanocrystal nanocomposite samples were analysed by HRTEM and silicon nanocrystals with a density of 1.2 × 10¹² cm⁻² were observed. From the reconstructed 3D tomogram, the averaged distance between the nearest nanoparticles is 8.3 nm and the 3D density of nanoparticles is 1.6 × 10¹⁸ cm⁻³.[Figure not available: see fulltext.]