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Inductively coupled plasma etching of GaN using SiCl4/Cl 2/Ar for submicron-sized features fabrication

  • R. Dylewicz
  • , R. A. Hogg
  • , P. W. Fry
  • , P. J. Parbrook
  • , R. Airey
  • , A. Tahraoui
  • , S. Patela

Research output: Contribution to journal › Article › peer-review

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