Influence of free radical surface activation on Si/SiC heterogeneous integration by direct wafer bonding

Pasqualino Torchia; Pietro Pampili; John O'Connell; Joe O'Brien; Mary White; Michael Schmidt; Brendan Sheehan; Finbarr Waldron; Justin D Holmes; Scott Monaghan; others

Influence of free radical surface activation on Si/SiC heterogeneous integration by direct wafer bonding

Pasqualino Torchia
, Pietro Pampili
, John O'Connell
, Joe O'Brien
, Mary White
, Michael Schmidt
, Brendan Sheehan
, Finbarr Waldron
, Justin D Holmes
, Scott Monaghan
, others

Research output: Contribution to journal › Article › peer-review

Original language	Undefined/Unknown
Journal	ECS Transactions
Publication status	Published - 2017

Cite this

@article{3362511a42ea468084e70b713b475bc4,

title = "Influence of free radical surface activation on Si/SiC heterogeneous integration by direct wafer bonding",

author = "Pasqualino Torchia and Pietro Pampili and John O'Connell and Joe O'Brien and Mary White and Michael Schmidt and Brendan Sheehan and Finbarr Waldron and Holmes, \{Justin D\} and Scott Monaghan and others",

year = "2017",

language = "Undefined/Unknown",

journal = "ECS Transactions",

issn = "1938-6737",

publisher = "Institute of Physics",

}

TY - JOUR

T1 - Influence of free radical surface activation on Si/SiC heterogeneous integration by direct wafer bonding

AU - Torchia, Pasqualino

AU - Pampili, Pietro

AU - O'Connell, John

AU - O'Brien, Joe

AU - White, Mary

AU - Schmidt, Michael

AU - Sheehan, Brendan

AU - Waldron, Finbarr

AU - Holmes, Justin D

AU - Monaghan, Scott

AU - others,

PY - 2017

Y1 - 2017

M3 - Article

SN - 1938-6737

JO - ECS Transactions

JF - ECS Transactions

ER -