Influence of nitrogen concentration on electrical, mechanical, and structural properties of tantalum nitride thin films prepared via DC magnetron sputtering
- Davoud Dastan
- , Ke Shan
- , Azadeh Jafari
- , Farzan Gity
- , Xi Tao Yin
- , Zhicheng Shi
- , Najlaa D. Alharbi
- , Bilal Ahmad Reshi
- , Wenbin Fu
- , Ştefan Ţălu
- , Loai Aljerf
- , Hamid Garmestani
- , Lida Ansari
- Cornell University
- Honghe University
- Lodz University of Technology
- Ludong University
- Ocean University of China
- University of Jeddah
- University of Mumbai
- Georgia Institute of Technology
- Technical University of Cluj-Napoca
- Damascus University
Research output: Contribution to journal › Article › peer-review