Influence of preamorphizatlon and recrystallization on indium doping profiles in silicon
- R. Duffy
- , V. C. Venezia
- , A. Heringa
- , B. J. Pawlak
- , M. J.P. Hopstaken
- , Y. Tamminga
- , T. Dao
- , F. Roozeboom
- , C. C. Wang
- , C. H. Diaz
- , P. B. Griffin
- Koninklijke Philips N.V.
- Taiwan Semiconductor Manufacturing Company
- Stanford University
Research output: Contribution to journal › Article › peer-review