Abstract
High bandwidth 2-μm wavelength surface normal p-i-n photodiodes using a high indium-content InGaAs strain-relaxed absorbing layer clad by p- and n-doped AlInGaAs layers are realized. A parabolic grading was used to relax the lattice constant from that of the InP substrate. We compare structures with different p-doping profiles and absorber thicknesses to achieve a 3-dB bandwidth of ∼10 GHz while maintaining a photoresponsivity of 0.93 A/W. A clear opening of the 10-Gb/s eye pattern was obtained with an input power of -3.07 dBm. By temperature-control of the mesa passivation process, the device leakage was reduced to 0.52 μA at -5 V bias.
| Original language | English |
|---|---|
| Article number | 7070709 |
| Pages (from-to) | 1469-1472 |
| Number of pages | 4 |
| Journal | IEEE Photonics Technology Letters |
| Volume | 27 |
| Issue number | 14 |
| DOIs | |
| Publication status | Published - 15 Jul 2015 |
Keywords
- 2 μm
- high speed photodiode
- InGaAs