InGaAs Surface Normal Photodiode for 2 μm Optical Communication Systems

Research output: Contribution to journalArticlepeer-review

Abstract

High bandwidth 2-μm wavelength surface normal p-i-n photodiodes using a high indium-content InGaAs strain-relaxed absorbing layer clad by p- and n-doped AlInGaAs layers are realized. A parabolic grading was used to relax the lattice constant from that of the InP substrate. We compare structures with different p-doping profiles and absorber thicknesses to achieve a 3-dB bandwidth of ∼10 GHz while maintaining a photoresponsivity of 0.93 A/W. A clear opening of the 10-Gb/s eye pattern was obtained with an input power of -3.07 dBm. By temperature-control of the mesa passivation process, the device leakage was reduced to 0.52 μA at -5 V bias.

Original languageEnglish
Article number7070709
Pages (from-to)1469-1472
Number of pages4
JournalIEEE Photonics Technology Letters
Volume27
Issue number14
DOIs
Publication statusPublished - 15 Jul 2015

Keywords

  • 2 μm
  • high speed photodiode
  • InGaAs

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