Intelligent Window Coatings: Atmospheric Pressure Chemical Vapor Deposition of Tungsten-Doped Vanadium Dioxide

Troy D. Manning; Ivan P. Parkin; Martyn E. Pemble; David Sheel; Dimitra Vernardou

doi:10.1021/cm034905y

Intelligent Window Coatings: Atmospheric Pressure Chemical Vapor Deposition of Tungsten-Doped Vanadium Dioxide

Troy D. Manning
, Ivan P. Parkin
, Martyn E. Pemble
, David Sheel
, Dimitra Vernardou

Research output: Contribution to journal › Article › peer-review

Abstract

Thin films of tungsten-doped vanadium(IV) oxide were prepared on glass substrates from the atmospheric pressure chemical vapor deposition of vanadium(IV) chloride, tungsten-(VI) ethoxide, and water at 500-600 °C. The films were characterized by Raman microscopy, glancing angle X-ray diffraction (GAXRD), X-ray photoelectron spectroscopy (XPS), Rutherford backscattering (RBS), scanning electron microscopy (SEM), and vis/IR reflectance-transmittance. The films showed a reduction in thermochromic transition temperatures from 68 °C in VO₂ to 42 °C in V_0.99W_0.01O ₂-approaching that required for commercial use as an intelligent window coating.

Original language	English
Pages (from-to)	744-749
Number of pages	6
Journal	Chemistry of Materials
Volume	16
Issue number	4
DOIs	https://doi.org/10.1021/cm034905y
Publication status	Published - 24 Feb 2004
Externally published	Yes

Access to Document

10.1021/cm034905y

Cite this

@article{c5ff952e9c0d4ef1834c20bc27b63ba2,

title = "Intelligent Window Coatings: Atmospheric Pressure Chemical Vapor Deposition of Tungsten-Doped Vanadium Dioxide",

abstract = "Thin films of tungsten-doped vanadium(IV) oxide were prepared on glass substrates from the atmospheric pressure chemical vapor deposition of vanadium(IV) chloride, tungsten-(VI) ethoxide, and water at 500-600 °C. The films were characterized by Raman microscopy, glancing angle X-ray diffraction (GAXRD), X-ray photoelectron spectroscopy (XPS), Rutherford backscattering (RBS), scanning electron microscopy (SEM), and vis/IR reflectance-transmittance. The films showed a reduction in thermochromic transition temperatures from 68 °C in VO2 to 42 °C in V0.99W0.01O 2-approaching that required for commercial use as an intelligent window coating.",

author = "Manning, \{Troy D.\} and Parkin, \{Ivan P.\} and Pemble, \{Martyn E.\} and David Sheel and Dimitra Vernardou",

year = "2004",

month = feb,

day = "24",

doi = "10.1021/cm034905y",

language = "English",

volume = "16",

pages = "744--749",

journal = "Chemistry of Materials",

issn = "0897-4756",

publisher = "American Chemical Society",

number = "4",

}

TY - JOUR

T1 - Intelligent Window Coatings

T2 - Atmospheric Pressure Chemical Vapor Deposition of Tungsten-Doped Vanadium Dioxide

AU - Manning, Troy D.

AU - Parkin, Ivan P.

AU - Pemble, Martyn E.

AU - Sheel, David

AU - Vernardou, Dimitra

PY - 2004/2/24

Y1 - 2004/2/24

N2 - Thin films of tungsten-doped vanadium(IV) oxide were prepared on glass substrates from the atmospheric pressure chemical vapor deposition of vanadium(IV) chloride, tungsten-(VI) ethoxide, and water at 500-600 °C. The films were characterized by Raman microscopy, glancing angle X-ray diffraction (GAXRD), X-ray photoelectron spectroscopy (XPS), Rutherford backscattering (RBS), scanning electron microscopy (SEM), and vis/IR reflectance-transmittance. The films showed a reduction in thermochromic transition temperatures from 68 °C in VO2 to 42 °C in V0.99W0.01O 2-approaching that required for commercial use as an intelligent window coating.

AB - Thin films of tungsten-doped vanadium(IV) oxide were prepared on glass substrates from the atmospheric pressure chemical vapor deposition of vanadium(IV) chloride, tungsten-(VI) ethoxide, and water at 500-600 °C. The films were characterized by Raman microscopy, glancing angle X-ray diffraction (GAXRD), X-ray photoelectron spectroscopy (XPS), Rutherford backscattering (RBS), scanning electron microscopy (SEM), and vis/IR reflectance-transmittance. The films showed a reduction in thermochromic transition temperatures from 68 °C in VO2 to 42 °C in V0.99W0.01O 2-approaching that required for commercial use as an intelligent window coating.

UR - https://www.scopus.com/pages/publications/1242297695

U2 - 10.1021/cm034905y

DO - 10.1021/cm034905y

M3 - Article

AN - SCOPUS:1242297695

SN - 0897-4756

VL - 16

SP - 744

EP - 749

JO - Chemistry of Materials

JF - Chemistry of Materials

IS - 4

ER -

Intelligent Window Coatings: Atmospheric Pressure Chemical Vapor Deposition of Tungsten-Doped Vanadium Dioxide

Abstract

Access to Document

Other files and links

Fingerprint

Cite this