Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface

  • V. S. Patil
  • , K. S. Agrawal
  • , A. G. Khairnar
  • , B. J. Thibeault
  • , A. M. Mahajan

Research output: Contribution to journal › Article › peer-review

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Material Science

Chemical Engineering