Intrinsic mismatch between floating-gate nonvolatile memory cell and equivalent transistor

  • Russell Duane
  • , Quentin Rafhay
  • , M. Florian Beug
  • , Michiel van Duuren

Research output: Contribution to journalArticlepeer-review

Abstract

The matching performance of nonvolatile memory cells and their equivalent transistors is investigated using a novel matching-performance factor. Extensive measurements on three technologies show that matching pairs can be found, but there is an inherent mobility mismatch between the equivalent transistor and the memory cell. It is suggested that the cause of this mismatch is due to the necessary layout differences between the cell and the equivalent transistor that can cause different levels of plasma-induced damage in the structures.

Original languageEnglish
Pages (from-to)440-442
Number of pages3
JournalIEEE Electron Device Letters
Volume28
Issue number5
DOIs
Publication statusPublished - May 2007

Keywords

  • Nonvolatile memory devices
  • Plasma charging
  • Test structure

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