Investigation of TiO2-doped HfO2 thin films deposited by photo-CVD
- Q. Fang
- , J. Y. Zhang
- , Z. M. Wang
- , J. X. Wu
- , B. J. O'Sullivan
- , P. K. Hurley
- , T. L. Leedham
- , H. Davies
- , M. A. Audier
- , C. Jimenez
- , J. P. Senateur
- , Ian W. Boyd
- University College London
- University of Science and Technology of China
- Inorgtech Limited
- Institut polytechnique de Grenoble
- J.I.P. Elec
Research output: Contribution to journal › Article › peer-review