Investigation on optical properties of CVD films used in MOEMS applications

M. Modreanu; M. Gartner

doi:10.1016/S0022-2860(00)00907-8

Investigation on optical properties of CVD films used in MOEMS applications

M. Modreanu
, M. Gartner

National Institute for Research and Development in Microtechnologies Romania
Institute of Physical Chemistry, Romanian Academy of Sciences

Research output: Contribution to journal › Article › peer-review

Abstract

Low-pressure chemical vapour deposition (LPCVD) amorphous silicon oxynitride (a-SiO_xN_y) thin films of various compositions as well as the atmospheric pressure chemical vapour deposition (APCVD) borophosphosilicate glass (BPSG) thin films with varying phosphorus and boron contents were investigated. The dependence of the optical properties of the films on the deposition temperature and the gas flow ratio was studied by spectroellipsometry (SE) and infrared spectroscopy (IR).

Original language	English
Pages (from-to)	519-523
Number of pages	5
Journal	Journal of Molecular Structure
Volume	565-566
DOIs	https://doi.org/10.1016/S0022-2860(00)00907-8
Publication status	Published - 30 May 2001
Externally published	Yes

Keywords

APCVD
BPSG
LPCVD
Optical properties
SiON

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10.1016/S0022-2860(00)00907-8

Cite this

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title = "Investigation on optical properties of CVD films used in MOEMS applications",

abstract = "Low-pressure chemical vapour deposition (LPCVD) amorphous silicon oxynitride (a-SiOxNy) thin films of various compositions as well as the atmospheric pressure chemical vapour deposition (APCVD) borophosphosilicate glass (BPSG) thin films with varying phosphorus and boron contents were investigated. The dependence of the optical properties of the films on the deposition temperature and the gas flow ratio was studied by spectroellipsometry (SE) and infrared spectroscopy (IR).",

keywords = "APCVD, BPSG, LPCVD, Optical properties, SiON",

author = "M. Modreanu and M. Gartner",

year = "2001",

month = may,

day = "30",

doi = "10.1016/S0022-2860(00)00907-8",

language = "English",

volume = "565-566",

pages = "519--523",

journal = "Journal of Molecular Structure",

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publisher = "Elsevier B.V.",

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T1 - Investigation on optical properties of CVD films used in MOEMS applications

AU - Modreanu, M.

AU - Gartner, M.

PY - 2001/5/30

Y1 - 2001/5/30

N2 - Low-pressure chemical vapour deposition (LPCVD) amorphous silicon oxynitride (a-SiOxNy) thin films of various compositions as well as the atmospheric pressure chemical vapour deposition (APCVD) borophosphosilicate glass (BPSG) thin films with varying phosphorus and boron contents were investigated. The dependence of the optical properties of the films on the deposition temperature and the gas flow ratio was studied by spectroellipsometry (SE) and infrared spectroscopy (IR).

AB - Low-pressure chemical vapour deposition (LPCVD) amorphous silicon oxynitride (a-SiOxNy) thin films of various compositions as well as the atmospheric pressure chemical vapour deposition (APCVD) borophosphosilicate glass (BPSG) thin films with varying phosphorus and boron contents were investigated. The dependence of the optical properties of the films on the deposition temperature and the gas flow ratio was studied by spectroellipsometry (SE) and infrared spectroscopy (IR).

KW - APCVD

KW - BPSG

KW - LPCVD

KW - Optical properties

KW - SiON

UR - https://www.scopus.com/pages/publications/0035972683

U2 - 10.1016/S0022-2860(00)00907-8

DO - 10.1016/S0022-2860(00)00907-8

M3 - Article

AN - SCOPUS:0035972683

SN - 0022-2860

VL - 565-566

SP - 519

EP - 523

JO - Journal of Molecular Structure

JF - Journal of Molecular Structure

ER -

Investigation on optical properties of CVD films used in MOEMS applications

Abstract

Keywords

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