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(Invited) Evaluation of Few-Layer MoS2 Transistors with a Top Gate and HfO2 Dielectric

  • Paul Hurley

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
JournalMeeting Abstracts
DOIs
Publication statusPublished - 2016

Keywords

  • Materials science
  • Dielectric
  • Transistor
  • Optoelectronics
  • Nanotechnology
  • Engineering physics
  • Gate dielectric
  • Field-effect transistor
  • Quantum tunnelling
  • Electrical engineering
  • Engineering
  • Voltage

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