Laser and transistor material on Si substrate

  • Dzianis Saladukha
  • , Tomasz J. Ochalski
  • , Felipe Murphy Armando
  • , Michael B. Clavel
  • , Mantu K. Hudait

Research output: Chapter in Book/Report/Conference proceedingsConference proceedingpeer-review

Abstract

In this work we study Ge structures grown on silicon substrates. We use photoluminescence and photoreflectance to determine both direct and indirect gap of Ge under tensile strain. The strain is induced by growing the Ge on an InGaAs buffer layer with variable In content. The band energy levels are modeled by a 30 band k·p model based on first principles calculations. Characterization techniques show very good agreement with the calculated energy values.

Original languageEnglish
Title of host publicationSilicon Photonics XII
EditorsAndrew P. Knights, Graham T. Reed
PublisherSPIE
ISBN (Electronic)9781510606579
DOIs
Publication statusPublished - 2017
Externally publishedYes
EventSilicon Photonics XII 2017 - San Francisco, United States
Duration: 30 Jan 20171 Feb 2017

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume10108
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceSilicon Photonics XII 2017
Country/TerritoryUnited States
CitySan Francisco
Period30/01/171/02/17

Keywords

  • Ge biaxial strain
  • Ge on InGaAs
  • Ge photoluminescence
  • Ge Si
  • Ge TFeT
  • Photoreflectance
  • Tensile Ge

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