Leakage current effects on CV plots of high-k metal-oxide-semiconductor capacitors

Y Lu; S Hall; LZ Tan; IZ Mitrovic; WM Davey; Bahman Raeissi; Olof Engström; K Cherkaoui; S Monaghan; PK Hurley; others

Leakage current effects on CV plots of high-k metal-oxide-semiconductor capacitors

Y Lu
, S Hall
, LZ Tan
, IZ Mitrovic
, WM Davey
, Bahman Raeissi
, Olof Engström
, K Cherkaoui
, S Monaghan
, PK Hurley
, others

Research output: Contribution to journal › Article › peer-review

Original language	Undefined/Unknown
Journal	Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Publication status	Published - 2009

Cite this

@article{61b961c3d54c4e55a1dc52c757ba71ed,

title = "Leakage current effects on CV plots of high-k metal-oxide-semiconductor capacitors",

author = "Y Lu and S Hall and LZ Tan and IZ Mitrovic and WM Davey and Bahman Raeissi and Olof Engstr{\"o}m and K Cherkaoui and S Monaghan and PK Hurley and others",

year = "2009",

language = "Undefined/Unknown",

journal = "Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena",

}

TY - JOUR

T1 - Leakage current effects on CV plots of high-k metal-oxide-semiconductor capacitors

AU - Lu, Y

AU - Hall, S

AU - Tan, LZ

AU - Mitrovic, IZ

AU - Davey, WM

AU - Raeissi, Bahman

AU - Engström, Olof

AU - Cherkaoui, K

AU - Monaghan, S

AU - Hurley, PK

AU - others,

PY - 2009

Y1 - 2009

M3 - Article

JO - Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

JF - Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

ER -