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Low-dimensional waveguide grating fabrication in GaN with Use of SiCl 4/Cl 2/ar-based inductively coupled plasma dry etching

  • R. Dylewicz
  • , S. Patela
  • , R. A. Hogg
  • , P. W. Fry
  • , P. J. Parbrook
  • , R. Airey
  • , A. Tahraoui
  • Wrocław University of Science and Technology
  • University of Glasgow
  • University of Sheffield

Research output: Contribution to journal › Article › peer-review

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