Low-temperature diffusion of high-concentration phosphorus in silicon, a preferential movement toward the surface
- R. Duffy
- , V. C. Venezia
- , J. Loo
- , M. J.P. Hopstaken
- , M. A. Verheijen
- , J. G.M. Van Berkum
- , G. C.J. Maas
- , Y. Tamminga
- , T. Dao
- , C. Demeurisse
- Koninklijke Philips N.V.
- Interuniversitair Micro-Elektronica Centrum
Research output: Contribution to journal › Article › peer-review