Luminescence and stimulated emission from GaN on silicon substrates heterostructures

  • G. P. Yablonskii
  • , E. V. Lutsenko
  • , V. N. Pavlovskii
  • , V. Z. Zubialevich
  • , A. L. Gurskii
  • , H. Kalisch
  • , A. Szymakowskii
  • , R. A. Jansen
  • , A. Alam
  • , Y. Dikme
  • , B. Schineller
  • , M. Heuken

Research output: Contribution to journalArticlepeer-review

Abstract

Photoluminescence (PL) and stimulated emission of GaN/Si layers grown by MOVPE with AlN and AlGaN buffers have been investigated. It has been found that thermal annealing of samples in nitrogen gas flow leads to an increase of the PL efficiency of up to 20 times, with a thermal activation energy of this process of 3.1-3.4 eV. The annealing promotes a significant decrease of the non-radiative center concentration and an increase of the number of shallow states. The laser action at λ = 377 nm under pulsed optical excitation was achieved at room temperature evidencing a high quality of the samples.

Original languageEnglish
Pages (from-to)54-59
Number of pages6
JournalPhysica Status Solidi (A) Applied Research
Volume192
Issue number1
DOIs
Publication statusPublished - Jul 2002
Externally publishedYes
Event4th International Symposium on Blue Lasers and Light Emitting Diodes (ISBLLED-2002) - Cordoba, Spain
Duration: 11 Mar 200215 Mar 2002

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