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Materials and Defect Aspects of III-V and III-N Devices for High-Speed Analog/RF Applications

  • Eddy Simoen
  • , Po Chun Brent Hsu
  • , Hao Yu
  • , Hongyue Wang
  • , Ming Zhao
  • , Kenichiro Takakura
  • , Vamsi Putcha
  • , Uthayasankaran Peralagu
  • , Bertrand Parvais
  • , Niamh Waldron
  • , Nadine Collaert

Research output: Chapter in Book/Report/Conference proceedingsConference proceedingpeer-review

Abstract

This paper describes the application of Deep Level Transient Spectroscopy and Generation-Recombination Noise Spectroscopy to the study of trap levels in III-V and III-N materials and devices.

Original languageEnglish
Title of host publication2020 IEEE 15th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2020 - Proceedings
EditorsShaofeng Yu, Xiaona Zhu, Ting-Ao Tang
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781728162355
DOIs
Publication statusPublished - 3 Nov 2020
Externally publishedYes
Event15th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2020 - Virtual, Kunming, China
Duration: 3 Nov 20206 Nov 2020

Publication series

Name2020 IEEE 15th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2020 - Proceedings

Conference

Conference15th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2020
Country/TerritoryChina
CityVirtual, Kunming
Period3/11/206/11/20

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