Mechanism of Thermal Atomic Layer Etch of W Metal Using Sequential Oxidation and Chlorination: A First-Principles Study
- Suresh Kondati Natarajan
- , Michael Nolan
- , Patrick Theofanis
- , Charles Mokhtarzadeh
- , Scott B. Clendenning
- Aalto University
- Ulster University
- Intel
Research output: Contribution to journal › Article › peer-review