Mechanisms of low frequency noise in P channel MOSFETs

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Abstract

In this paper we examine mechanisms of low frequency noise in p channel silicon MOSFETs. In particular the difference in the magnitude of the noise exhibited by p and n channel transistors is investigated in relation to the McWhorter theory, based on trapping and emission of inversion layer charge by states in the gate oxide. New results are presented for noise level dispersion as a function of device geometry for p channel transistors. Furthermore, the dependence of the drain current noise in saturation is examined for p and n channel devices.

Original languageEnglish
Title of host publicationEuropean Solid-State Device Research Conference
EditorsPeter Ashburn, Chris Hill
PublisherIEEE Computer Society
Pages147-150
Number of pages4
ISBN (Electronic)2863321579
Publication statusPublished - 1994
Event24th European Solid State Device Research Conference, ESSDERC 1994 - Edinburgh, United Kingdom
Duration: 11 Sep 199415 Sep 1994

Publication series

NameEuropean Solid-State Device Research Conference
ISSN (Print)1930-8876

Conference

Conference24th European Solid State Device Research Conference, ESSDERC 1994
Country/TerritoryUnited Kingdom
CityEdinburgh
Period11/09/9415/09/94

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