Mesoporous oxides as low dielectric constant materials

This paper describes the use of a modified sol-gel route in which a cationic structure directing agent (SDA) is added to the sol-gel mixture for the construction of an inter level dielectric material. Similar approaches are established routes for the production of non-silica periodic mesostructural powder samples. However, in this case, the strategy is employed with the aim of depositing a coherent aluminosilicate layer that has an ordered and uniform pore-structure on electronic substrates for use as a low k dielectric material. The pore structure is obtained by decomposing the SDA around which the oxide material is formed by the use of an ozone treatment.