Skip to main navigation Skip to search Skip to main content

Minimization of via count in multiple-metal inductors: Performance characterization and physical modelling

  • Olive H. Murphy
  • , Kevin G. McCarthy
  • , Patrick J. Murphy

Research output: Chapter in Book/Report/Conference proceedingsConference proceedingpeer-review

Abstract

High Q on-chip inductors are vital for modern RF ICs. A proven method of Q-enhancement is to use multiple metals stacked in a shunt manner, with a dense array of vias. The impact of fewer vias has not been investigated before. Here, we show that the same Q can be achieved with significantly fewer vias, thus simplifying the inductor layout. The traditional and new approaches are explained and physical models developed which give excellent agreement between simulations and measurements up to 6GHz.

Original languageEnglish
Title of host publication2006 IEEE Radio Frequency Integrated Circuits(RFIC) Symposium - Digest of Papers
Pages490-493
Number of pages4
Publication statusPublished - 2006
Event2006 IEEE Radio Frequency Integrated Circuits Symposium - San Francisco, CA, United States
Duration: 11 Jun 200613 Jun 2006

Publication series

NameDigest of Papers - IEEE Radio Frequency Integrated Circuits Symposium
Volume2006
ISSN (Print)1529-2517

Conference

Conference2006 IEEE Radio Frequency Integrated Circuits Symposium
Country/TerritoryUnited States
CitySan Francisco, CA
Period11/06/0613/06/06

Keywords

  • Inductor
  • Microwave integrated circuits
  • Modelling
  • Q factor
  • Q measurement
  • Simulation

Fingerprint

Dive into the research topics of 'Minimization of via count in multiple-metal inductors: Performance characterization and physical modelling'. Together they form a unique fingerprint.

Cite this