MOCVD of ZrN: Tuning Thin Film Properties Towards Catalytic Applications

Ji Liu

doi:10.1149/ma2023-02472352mtgabs

MOCVD of ZrN: Tuning Thin Film Properties Towards Catalytic Applications

Ji Liu

Research output: Contribution to journal › Article › peer-review

Original language	English
Journal	Meeting Abstracts
DOIs	https://doi.org/10.1149/ma2023-02472352mtgabs
Publication status	Published - 2023

Keywords

Metalorganic vapour phase epitaxy
Materials science
Catalysis
Thin film
Nanotechnology
Chemical engineering
Optoelectronics
Chemistry
Organic chemistry
Epitaxy
Engineering
Layer (electronics)

Access to Document

10.1149/ma2023-02472352mtgabs

https://openalex.org/W4391663325Licence: CC BY-NC-ND

Cite this

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title = "MOCVD of ZrN: Tuning Thin Film Properties Towards Catalytic Applications",

keywords = "Metalorganic vapour phase epitaxy, Materials science, Catalysis, Thin film, Nanotechnology, Chemical engineering, Optoelectronics, Chemistry, Organic chemistry, Epitaxy, Engineering, Layer (electronics)",

author = "Ji Liu",

year = "2023",

doi = "10.1149/ma2023-02472352mtgabs",

language = "English",

journal = "Meeting Abstracts",

issn = "1091-8213",

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T1 - MOCVD of ZrN: Tuning Thin Film Properties Towards Catalytic Applications

AU - Liu, Ji

PY - 2023

Y1 - 2023

KW - Metalorganic vapour phase epitaxy

KW - Materials science

KW - Catalysis

KW - Thin film

KW - Nanotechnology

KW - Chemical engineering

KW - Optoelectronics

KW - Chemistry

KW - Organic chemistry

KW - Epitaxy

KW - Engineering

KW - Layer (electronics)

U2 - 10.1149/ma2023-02472352mtgabs

DO - 10.1149/ma2023-02472352mtgabs

M3 - Article

SN - 1091-8213

JO - Meeting Abstracts

JF - Meeting Abstracts

ER -