Abstract
We present a study of magnesium and calcium precursor molecules in order to predict which of them would be more successful in atomic layer deposition (ALD) of metal oxides. Precursor chemistry plays a key role in ALD, since precursors must be volatile, thermally stable, chemisorb on the surface, and react rapidly with existing surface groups. We investigate one aspect of this, surface reactivity between ligands and hydroxyl groups, via a gas-phase model with energetics computed at the level of density functional theory (DFT). The precursors with higher reactivity towards hydrolysis (and thus most potentially useful for ALD) are M(bae), M(Ph-nacnac)2, and M(tmtate), which is rationalized as due to strain, particularly in the cyclic ligands bae and tmtate. Calculated trends for Mg and Ca follow each other closely, reflecting the similar chemistry among group 2 metals. A study of magnesium and calcium precursor molecules with various ligands is presented in order to predict which ligands would be the most successful in atomic layer deposition (ALD) of the metal oxides. The work investigates one aspect of this, surface reactivity between ligands and hydroxyl groups, via a gas-phase model with energetics computed at the level of density functional theory (DFT).
| Original language | English |
|---|---|
| Pages (from-to) | 117-124 |
| Number of pages | 8 |
| Journal | Chemical Vapor Deposition |
| Volume | 19 |
| Issue number | 4-6 |
| DOIs | |
| Publication status | Published - Jun 2013 |
Keywords
- ALD
- Calcium oxide
- Chemical modelling
- Magnesium oxide
Fingerprint
Dive into the research topics of 'Modeling of precursors for atomic layer deposition of magnesium and calcium oxide'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver