Monolithic integration of III-V semiconductors by selective area growth on Si(001) substrate: Epitaxy challenges & applications

  • C. Merckling
  • , S. Jiang
  • , Z. Liu
  • , N. Waldron
  • , G. Boccardi
  • , R. Rooyackers
  • , Z. Wang
  • , B. Tian
  • , M. Pantouvaki
  • , N. Collaert
  • , J. Van Campenhout
  • , M. Heyns
  • , D. Van Thourhout
  • , W. Vandervorst
  • , A. Thean

Research output: Chapter in Book/Report/Conference proceedingsChapterpeer-review

Abstract

This study relates to the selective area growth (SAG) of III-V semiconductors on Silicon substrates. Both approaches, growth in trenches and NWs bottom-up growth, are considered and discussed. We demonstrated in a first part a high control of the two-step InP buffer growth in STI trench width below 20 nm. First GaAs NWs from production MOVPE tool are also shown in a second part. Finally we conclude with the different applications using III-V semiconductors successfully integrated on Silicon substrates.

Original languageEnglish
Title of host publicationSilicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 5
EditorsE. P. Gusev, P. J. Timans, F. Roozeboom, S. DeGendt, K. Kakushima, V. Narayanan, Z. Karim
PublisherElectrochemical Society Inc.
Pages107-116
Number of pages10
Edition4
ISBN (Electronic)9781607685395
DOIs
Publication statusPublished - 2015
Externally publishedYes
EventSymposium on Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 5 - 227th ECS Meeting - Chicago, United States
Duration: 24 May 201528 May 2015

Publication series

NameECS Transactions
Number4
Volume66
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

ConferenceSymposium on Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 5 - 227th ECS Meeting
Country/TerritoryUnited States
CityChicago
Period24/05/1528/05/15

Fingerprint

Dive into the research topics of 'Monolithic integration of III-V semiconductors by selective area growth on Si(001) substrate: Epitaxy challenges & applications'. Together they form a unique fingerprint.

Cite this