Morphology of sputtering damage on Cu (111) studied by scanning tunneling microscopy

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Abstract

The morphology of Cu(111) after bombardment with 1 keV Ar ions and its dependence on temperature have been investigated using STM. Qualitative agreement is found with experiments conducted by other groups on Pt(111), but with more pronounced temperature influences. In addition, interlayer mass transport was observed to have a more important effect on Cu(111). The Cu(111) surface only slowly approaches equilibrium shape at room temperature. A series of images illustrates how the surface changes over a period of several hours following ion bombardment.

Original languageEnglish
Pages (from-to)212-219
Number of pages8
JournalSurface Science
Volume388
Issue number1-3
DOIs
Publication statusPublished - 23 Oct 1997
Externally publishedYes

Keywords

  • Copper
  • Ion damage
  • Low index single crystal surfaces
  • Scanning tunneling microscopy
  • Sputtering
  • Surface diffusion

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