Abstract
In this study the morphology and composition of In xGa 1-xN/GaN multiple quantum well structures and their sensitivity to electron beam damage is examined. Characterization was performed using high-resolution transmission electron microscopy, energy dispersive X-ray analysis and scanning transmission electron microscopy. Exposure to relatively low incident beam illumination, corresponding to current densities at the specimen of ∼100A/cm 2 cumulated in a significant redistribution of indium within the multiple quantum wells. The findings highlight the need for caution when interpreting analytical data obtained from InGaN/GaN multiple quantum wells studied in the transmission electron microscope.
| Original language | English |
|---|---|
| Pages (from-to) | 297-300 |
| Number of pages | 4 |
| Journal | Design and Nature |
| Volume | 6 |
| Publication status | Published - 2004 |
| Externally published | Yes |
| Event | Design and Nature II: Comparing Design in Nature with Science and Engineering - Rhodes, Greece Duration: 28 Jun 2004 → 30 Jun 2004 |