Nano-clustering anomalies in InGaN/GaN multiple quantum well structures

Research output: Contribution to journalArticlepeer-review

Abstract

In this study the morphology and composition of In xGa 1-xN/GaN multiple quantum well structures and their sensitivity to electron beam damage is examined. Characterization was performed using high-resolution transmission electron microscopy, energy dispersive X-ray analysis and scanning transmission electron microscopy. Exposure to relatively low incident beam illumination, corresponding to current densities at the specimen of ∼100A/cm 2 cumulated in a significant redistribution of indium within the multiple quantum wells. The findings highlight the need for caution when interpreting analytical data obtained from InGaN/GaN multiple quantum wells studied in the transmission electron microscope.

Original languageEnglish
Pages (from-to)297-300
Number of pages4
JournalDesign and Nature
Volume6
Publication statusPublished - 2004
Externally publishedYes
EventDesign and Nature II: Comparing Design in Nature with Science and Engineering - Rhodes, Greece
Duration: 28 Jun 200430 Jun 2004

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