Abstract
In this study the morphology and composition of InxGa1-xN/GaN multiple quantum well structures and their sensitivity to electron beam damage is examined. Characterization was performed using high-resolution transmission electron microscopy, energy dispersive X-ray analysis and scanning transmission electron microscopy. Exposure to relatively low incident beam illumination, corresponding to current densities at the specimen of ~100A/cm2 cumulated in a significant redistribution of indium within the multiple quantum wells. The findings highlight the need for caution when interpreting analytical data obtained from InGaN/GaN multiple quantum wells studied in the transmission electron microscope.
| Original language | English |
|---|---|
| Title of host publication | Microscopy of Semiconducting Materials 2003 |
| Publisher | CRC Press |
| Pages | 297-300 |
| Number of pages | 4 |
| ISBN (Electronic) | 9781351083089 |
| ISBN (Print) | 0750309792, 9781315895536 |
| DOIs | |
| Publication status | Published - 1 Jan 2018 |
| Externally published | Yes |
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