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Nano-clustering anomalies in InGaN/GaN multiple quantum well structures

Research output: Chapter in Book/Report/Conference proceedingsChapterpeer-review

Abstract

In this study the morphology and composition of InxGa1-xN/GaN multiple quantum well structures and their sensitivity to electron beam damage is examined. Characterization was performed using high-resolution transmission electron microscopy, energy dispersive X-ray analysis and scanning transmission electron microscopy. Exposure to relatively low incident beam illumination, corresponding to current densities at the specimen of ~100A/cm2 cumulated in a significant redistribution of indium within the multiple quantum wells. The findings highlight the need for caution when interpreting analytical data obtained from InGaN/GaN multiple quantum wells studied in the transmission electron microscope.

Original languageEnglish
Title of host publicationMicroscopy of Semiconducting Materials 2003
PublisherCRC Press
Pages297-300
Number of pages4
ISBN (Electronic)9781351083089
ISBN (Print)0750309792, 9781315895536
DOIs
Publication statusPublished - 1 Jan 2018
Externally publishedYes

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